Summary of ISO/TC 201 Standard: II ISO 14237:2000?Surface chemical analysis?Secondary ion mass spectrometry?Determination of boron atomic concentration in silicon using uniformly doped materials-Reference-Cited by-同舟云学术

Summary of ISO/TC 201 Standard: II ISO 14237:2000?Surface chemical analysis?Secondary ion mass spectrometry?Determination of boron atomic concentration in silicon using uniformly doped materials

Published:2002 Issue:4 Volume:33 Page:361-362
ISSN:0142-2421
Container-title:Surface and Interface Analysis
language:en
Short-container-title:Surf. Interface Anal.

Author:

Homma Y.

Publisher

Wiley

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference5 articles.

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2. Secondary ion mass spectrometry round-robin study of impurity analysis in gallium arsenide using uniformly-doped standard gallium arsenide specimens

3. In Secondary Ion Mass Spectrometry SIMS IX, (eds). John Wiley: Chichester, 1994; 140.

4. In Secondary Ion Mass Spectrometry SIMS X, (eds). John Wiley: Chichester, 1997; 661.

5. In Secondary Ion Mass Spectrometry SIMS X, (eds). John Wiley: Chichester, 1997; 681.

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