Decoupling of ion- and photon-activation mechanisms in polymer surfaces exposed to low-temperature plasmas
Author:
Affiliation:
1. Institute for Experimental Physics II; Ruhr-University Bochum; Universitätsstr. 150 Bochum 44780 Germany
2. Technical and Macromolecular Chemistry; Paderborn University; Warburgerstr. 100 Paderborn 33098 Germany
Funder
Deutsche Forschungsgemeinschaft
Publisher
Wiley
Subject
Polymers and Plastics,Condensed Matter Physics
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1002/ppap.201700230/fullpdf
Reference28 articles.
1. Controlling roughness: from etching to nanotexturing and plasma-directed organization on organic and inorganic materials
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4. Adhesion of Thin CVD Films on Pulsed Plasma Pre-Treated Polypropylene
5. Selective Plasma Etching of Polymeric Substrates for Advanced Applications
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