Controlling roughness: from etching to nanotexturing and plasma-directed organization on organic and inorganic materials-Reference-Cited by-同舟云学术

Controlling roughness: from etching to nanotexturing and plasma-directed organization on organic and inorganic materials

Published:2011-04-14 Issue:17 Volume:44 Page:174021
ISSN:0022-3727
Container-title:Journal of Physics D: Applied Physics
language:
Short-container-title:J. Phys. D: Appl. Phys.

Author:

Gogolides Evangelos,Constantoudis Vassilios,Kokkoris George,Kontziampasis Dimitrios,Tsougeni Katerina,Boulousis George,Vlachopoulou Marilena,Tserepi Angeliki

Publisher

IOP Publishing

Subject

Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference67 articles.

1. Nanotextured super-hydrophobic transparent poly(methyl methacrylate) surfaces using high-density plasma processing

2. Nanotexturing of poly(dimethylsiloxane) in plasmas for creating robust super-hydrophobic surfaces

3. Progess in superhydrophobic surface development

4. Preparation and Characterisation of Super-Hydrophobic Surfaces

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