Influence of the applied power on the barrier performance of silicon-containing plasma polymer coatings using a hollow cathode-activated PECVD process-Reference-Cited by-同舟云学术

Influence of the applied power on the barrier performance of silicon-containing plasma polymer coatings using a hollow cathode-activated PECVD process

Published:2017-03-27 Issue:9 Volume:14 Page:1700016
ISSN:1612-8850
Container-title:Plasma Processes and Polymers
language:en
Short-container-title:Plasma Process Polym

Author:

Top Michiel¹²^ORCID,Fahlteich John¹,De Hosson Jeff T. M.²

Affiliation:

1. Fraunhofer Institute for Organic Electronics; Electron Beam and Plasma Technology FEP; Dresden Germany

2. Department of Applied Physics; University of Groningen; Groningen The Netherlands

Funder

Fraunhofer-Gesellschaft

Publisher

Wiley

Subject

Polymers and Plastics,Condensed Matter Physics

Reference35 articles.

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2. Packaging barrier films deposited on PET by PECVD using a new high density plasma source

3. Fundamentals of Tribology and Bridging the Gap Between the Macro- and Micro/Nanoscales

4. High rate low pressure plasma-enhanced chemical vapor deposition for barrier and optical coatings

5. Hollow-cathode activated PECVD for the high-rate deposition of permeation barrier films

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