High rate low pressure plasma-enhanced chemical vapor deposition for barrier and optical coatings-Reference-Cited by-同舟云学术

High rate low pressure plasma-enhanced chemical vapor deposition for barrier and optical coatings

Published:2013-04 Issue: Volume:532 Page:44-49
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Günther Steffen,Fahland Matthias,Fahlteich John,Meyer Björn,Straach Steffen,Schiller Nicolas

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference12 articles.

1. 8th International Conference on Coatings on Glass and Plastics, ICCG 2010;Fahlteich,2010

2. S. Günther, Der Prozess der plasmaunterstützten Aluminiumbedampfung und die Eigenschaften dadurch hergestellter Schichten. Ph.D. thesis; TU Ilmenau; 2007.

3. 52nd Annual Technical Conference of the Society of Vacuum Coaters SVC. St. Clara, USA;Günther,2009

4. Transparent barrier coatings on polyethylene terephthalate by single- and dual-frequency plasma-enhanced chemical vapor deposition

5. 51st Annual Technical Conference of the Society of Vacuum Coaters SVC. Chicago, USA;Fahlteich,2008

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