Ion Energy and Angular Distribution in Biased Inductively Coupled Ar/O 2 Discharges by Using a Hybrid Model-Reference-Cited by-同舟云学术

Ion Energy and Angular Distribution in Biased Inductively Coupled Ar/O 2 Discharges by Using a Hybrid Model

Published:2017-03-03 Issue:4-5 Volume:14 Page:1600100
ISSN:1612-8850
Container-title:Plasma Processes and Polymers
language:en
Short-container-title:Plasma Process Polym

Author:

Wen De‐Qi¹²,Zhang Yu‐Ru¹³,Lieberman Michael A.²,Wang You‐Nian¹

Affiliation:

1. Key Laboratory of Materials Modification by Laser, Ion, and Electron Beams (Ministry of Education), School of Physics and Optoelectronic TechnologyDalian University of TechnologyDalian116024China

2. Department of Electrical Engineering and Computer Sciences − 1770University of CaliforniaBerkeley94720California

3. Research Group PLASMANT, Department of ChemistryUniversity of AntwerpCampus Drie Eiken, Universiteitsplein 1BE‐2610Wilrijk‐AntwerpBelgium

Funder

Natural Science Foundation of China

Fusion Energy Sciences

Lam Research Corporation

Publisher

Wiley

Subject

Polymers and Plastics,Condensed Matter Physics

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/ppap.201600100

Reference34 articles.

1. Principles of Plasma Discharges and Materials Processing

2. Plasma Electronics

3. Hybrid modelling of low temperature plasmas for fundamental investigations and equipment design

4. Charged species dynamics in an inductively coupled Ar/SF6 plasma discharge

5. Predictions of ion energy distributions and radical fluxes in radio frequency biased inductively coupled plasma etching reactors

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