Predictions of ion energy distributions and radical fluxes in radio frequency biased inductively coupled plasma etching reactors
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.361152
Reference27 articles.
1. Review of inductively coupled plasmas for plasma processing
2. Novel radio‐frequency induction plasma processing techniques
3. Electron energy distribution function measurements in a planar inductive oxygen radio frequency glow discharge
4. Optical ion energy measurements in a radio‐frequency‐induction plasma source
5. Application of a high density inductively coupled plasma reactor to polysilicon etching
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