First in situ Optical Emission Spectroscopy measurements during cesium low-energy depth profiling-Reference-Cited by-同舟云学术

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First in situ Optical Emission Spectroscopy measurements during cesium low-energy depth profiling

Published:2012-07-15 Issue:1 Volume:45 Page:61-64
ISSN:0142-2421
Container-title:Surface and Interface Analysis
language:en
Short-container-title:Surf. Interface Anal.

Author:

Mine N.¹,Houssiau L.¹

Affiliation:

1. Research Centre in Physics of Matter and Radiation (PMR); University of Namur (FUNDP); 61 rue de Bruxelles B5000 Namur Belgium

Publisher

Wiley

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/sia.5076/fullpdf

Reference17 articles.

1. Preliminary evaluation of an SF5+ polyatomic primary ion beam for analysis of organic thin films by secondary ion mass spectrometry

2. TOF-SIMS with Argon Gas Cluster Ion Beams: A Comparison with C60+

3. Molecular depth profiling of multilayer structures of organic semiconductor materials by secondary ion mass spectrometry with large argon cluster ion beams

4. Cluster secondary ion mass spectrometry of polymers and related materials

5. Comparative Study of the Usefulness of Low Energy Cs+, Xe+, and O2+ Ions for Depth Profiling Amino-Acid and Sugar Films

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. XPS Evidence for Negative Ion Formation in SIMS Depth Profiling of Organic Material with Cesium;The Journal of Physical Chemistry C;2014-11-10

2. Atomic spectrometry update. Review of advances in the analysis of metals, chemicals and functional materials;J. Anal. At. Spectrom.;2014-09-26

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