Direct In Situ Observation of the Early‐Stage Disorder–Order Evolution of Perpendicular Lamellae in Thermally Annealed High‐χ Block Copolymer Thin Films
Author:
Affiliation:
1. Department of Materials Science and EngineeringTokyo Institute of Technology 2‐12‐1‐S8‐36 Ookayama, Meguro‐ku Tokyo 152–8552 Japan
2. Evolving Nano‐process Infrastructure Development Center 16‐1 Onogawa, Tsukuba‐shi Ibaraki 305‐8569 Japan
Funder
New Energy and Industrial Technology Development Organization
Japan Society for the Promotion of Science
Ogasawara Foundation for the Promotion of Science and Engineering
Publisher
Wiley
Subject
Mechanical Engineering,Mechanics of Materials
Link
https://onlinelibrary.wiley.com/doi/pdf/10.1002/admi.201801401
Reference35 articles.
1. Block Copolymer Lithography
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5. Directed self-assembly of block copolymers for use in bit patterned media fabrication
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