High-Aspect-Ratio Parallel-Plate Microchannels Applicable to Kinetic Analysis of Chemical Vapor Deposition

Author:

Shima Kohei1,Funato Yuichi1,Sugiura Hidetoshi1,Sato Noboru1,Fukushima Yasuyuki2,Momose Takeshi1,Shimogaki Yukihiro1

Affiliation:

1. Department of Materials Engineering; The University of Tokyo; 7-3-1 Hongo Bunkyo Tokyo 113-8656 Japan

2. Advanced Applied Science Department Research Laboratory; IHI Corporation; 1, Shin-Nakahara Isogo Yokohama Kanagawa 235-8501 Japan

Funder

Nanotechnology Platform

Ministry of Education, Culture, Sports, Science, and Technology

Excellent Graduate Schools

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials

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