Conformal and Stoichiometric Chemical Vapor Deposition of Silicon Carbide onto Ultradeep Heterogeneous Micropores by Controlling the Initial Nucleation Stage-Reference-Cited by-同舟云学术

Conformal and Stoichiometric Chemical Vapor Deposition of Silicon Carbide onto Ultradeep Heterogeneous Micropores by Controlling the Initial Nucleation Stage

Published:2021-10-29 Issue:44 Volume:13 Page:53009-53020
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Shima Kohei¹^ORCID,Otaka Yuhei¹,Sato Noboru¹,Funato Yuichi¹,Fukushima Yasuyuki²,Momose Takeshi¹,Shimogaki Yukihiro¹

Affiliation:

1. Department of Materials Engineering, The University of Tokyo, Bunkyo, Tokyo 113-8656, Japan

2. Technology Platform Center, Technology & Intelligence Integration, IHI Corporation, Isogo, Yokohama 235-8501, Japan

Funder

Ministry of Economy, Trade and Industry

Japan Society for the Promotion of Science

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.1c13117

Reference80 articles.

1. CONTINUOUS SILICON CARBIDE FIBER OF HIGH TENSILE STRENGTH

2. Development of a silicon carbide fibre with high tensile strength

3. Fibre-matrix interphases and interfaces in ceramic matrix composites processed by CVI

4. The design of the fibre-matrix interfacial zone in ceramic matrix composites

5. Design, preparation and properties of non-oxide CMCs for application in engines and nuclear reactors: an overview

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