Hot-Wire Assisted ALD: A Study Powered by In Situ Spectroscopic Ellipsometry
Author:
Affiliation:
1. MESA+ Institute for Nanotechnology; University of Twente; P. O. Box 217 7500 AE Enschede The Netherlands
2. Toyota Motor Europe/Advanced Techonolgy Division; Hoge Wei 33 Zaventem 1930 Belgium
Funder
Stichting voor de Technische Wetenschappen
Publisher
Wiley
Subject
Mechanical Engineering,Mechanics of Materials
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1002/admi.201700058/fullpdf
Reference41 articles.
1. Atomic Layer Deposition: An Overview
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4. Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
5. Atomic layer deposition of GaN at low temperatures
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