On the noise limit of stress and temperature measurements with micro-Raman spectroscopy-Reference-Cited by-同舟云学术

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On the noise limit of stress and temperature measurements with micro-Raman spectroscopy

Published:2013-06-03 Issue:7 Volume:44 Page:1039-1044
ISSN:0377-0486
Container-title:Journal of Raman Spectroscopy
language:en
Short-container-title:J. Raman Spectrosc.

Author:

van Spengen W. Merlijn¹²,Roca Joan Belles³

Affiliation:

1. TU Delft, 3mE-PME-MNE; Mekelweg 2 2628CD Delft The Netherlands

2. Falco Systems; Van Boshuizenstraat 12 1083BA Amsterdam The Netherlands

3. Escola Tècnica Superior d'Enginyeria Industrial de Barcelona; Universitat Politècnica de Catalunya; Av. Diagonal 647 08028 Barcelona Spain

Publisher

Wiley

Subject

Spectroscopy,General Materials Science

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/jrs.4314/fullpdf

Reference9 articles.

1. Micro-Raman spectroscopy to study local mechanical stress in silicon integrated circuits

2. Stress measurements in Si microelectronics devices using Raman spectroscopy

3. The investigation of microsystems using Raman spectroscopy

4. Micro-Raman measurement of bending stresses in micromachined silicon flexures

5. Dynamic Operational Stress Measurement of MEMS Using Time-Resolved Raman Spectroscopy

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. In-Plane Displacement Detection With Picometer Accuracy on a Conventional Microscope;Journal of Microelectromechanical Systems;2015-06

2. Recent advances in linear and nonlinear Raman spectroscopy. Part VIII;Journal of Raman Spectroscopy;2014-11

3. Anatomy of noise in quantitative biological Raman spectroscopy;Bioanalysis;2014-02

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