Sheet‐carrier density and I‐V analysis of In 0.7 Ga 0.3 As/InAs/In 0.7 Ga 0.3 As/InAs/In 0.7 Ga 0.3 As dual channel double gate HEMT for THz applications
Author:
Affiliation:
1. ECE, SKP Engineering College Tiruvannamalai Tamil Nadu India
2. ECE, Bannari Amman Institute of Technology Sathyamangalam Tamil Nadu India
3. ECE, Arunai Engineering College Tiruvannamalai Tamil Nadu India
Publisher
Wiley
Subject
Electrical and Electronic Engineering,Computer Science Applications,Modeling and Simulation
Link
https://onlinelibrary.wiley.com/doi/pdf/10.1002/jnm.2625
Reference37 articles.
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2. Analytical modelling and electrical characterisation of ZnO based HEMTs;Verma YK;Int J Electron,2018
3. W‐band low‐noise InAlAs/InGaAs;Chao PC;IEEE Electron Device Lett,1990
4. Microwave performance of AlInAs‐GalnAs HEMT's with 0.2‐ and 0.1‐μm gate length;Mishra UK;IEEE Electron Device Lett,1988
5. EdwardYC ChingIK HweiPH Chia‐YuanC.InAs/In1‐xGaxAs composite channel high electron mobility transistors for high speed applications 2008 European Microwave Integrated Circuit Conference.2008;198–201.
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