Directing Block Copolymer Self-Assembly on Patterned Substrates-Reference-Cited by-同舟云学术

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Directing Block Copolymer Self-Assembly on Patterned Substrates

Published:2018-10-15 Issue:46 Volume:14 Page:1802872
ISSN:1613-6810
Container-title:Small
language:en
Short-container-title:Small

Author:

Gunkel Ilja¹^ORCID

Affiliation:

1. Adolphe Merkle Institute; University of Fribourg; Chemin des Verdiers 4 Fribourg CH-1700 Switzerland

Funder

Adolphe Merkle Foundation

Publisher

Wiley

Subject

Biomaterials,Biotechnology,General Materials Science,General Chemistry

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/smll.201802872/fullpdf

Reference69 articles.

1. Local Defectivity Control of 2D Self-Assembled Block Copolymer Patterns

2. Resist Free Patterning of Nonpreferential Buffer Layers for Block Copolymer Lithography

3. Templated Self-Assembly of Block Copolymers: Effect of Substrate Topography

4. A Bicontinuous Double Gyroid Hybrid Solar Cell

5. Isoporous Block Copolymer Membranes

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1. Directed Self‐Assembly of Polystyrene‐Block‐Polyhedral Oligomeric Silsesquioxane Monolayer by Nano‐Trench for Nanopatterning;Small;2024-07-19

2. Disclosing Topographical and Chemical Patterns in Confined Films of High-Molecular-Weight Block Copolymers under Controlled Solvothermal Annealing;Polymers;2024-07-08

3. Micropattern Fabricated by Acropetal Migration Controlled through Sequential Photo and Thermal Polymerization;Small;2024-07-07

4. Controlled Anisotropic Wetting by Plasma Treatment for Directed Self-Assembly of High-χ Block Copolymers;ACS Applied Materials & Interfaces;2024-05-17

5. Manipulating the processing window of directed self-assembly in contact hole shrinking with binary block copolymer/homopolymer blending;iScience;2024-04

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