Manipulating the processing window of directed self-assembly in contact hole shrinking with binary block copolymer/homopolymer blending-Reference-Cited by-同舟云学术

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Manipulating the processing window of directed self-assembly in contact hole shrinking with binary block copolymer/homopolymer blending

Published:2024-04 Issue:4 Volume:27 Page:109425
ISSN:2589-0042
Container-title:iScience
language:en
Short-container-title:iScience

Author:

Wu Zhiyong,Luo Jiacheng,Li Luyang,Dong Qingshu,Zhang Xiaohui,Li Zili^ORCID,Liu Yadong,Ji Shengxiang,Li Weihua,Zhang Yan,Xiong Shisheng

Funder

National Natural Science Foundation of China

Publisher

Elsevier BV

Reference44 articles.

1. DSA in combination with DUV lithography for Sub-10 nm Manufacturing;Li;Laser Optoelectron. Lett.,2022

2. International roadmap for devices and systems lithography roadmap;Mark;J. Micro/Nanopatterning Mater. Metrol.,2021

3. Block copolymer based nanostructures: materials, processes, and applications to electronics;Kim;Chem. Rev.,2010

4. Directed self-assembly of block copolymers for sub-10 nm fabrication;Chen;Int. J. Extrem. Manuf.,2020

5. Self-aligned assembly of a poly(2-vinylpyridine)-b-polystyrene-b-poly(2-vinylpyridine) triblock copolymer on graphene nanoribbons;Zhou;ACS Appl. Mater. Interfaces,2021

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