ArF excimer laser resists based on fluoroalcohol
Author:
Publisher
Wiley
Subject
Polymers and Plastics
Reference67 articles.
1. Acid-catalyzed single-layer resists for ArF lithography
2. High performance acrylic polymers for chemically amplified photoresist applications
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5. Surface Imaging Resists for 193 nm Lithography
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1. Fundamental investigation on interaction between hexafluoroisopropylalcohol-containing styrene and photochemical acid generator for rationale design of photoresist system;Journal of Polymer Science Part A: Polymer Chemistry;2018-12-04
2. Dynamics of Radical Ions of Hydroxyhexafluoroisopropyl-Substituted Benzenes;The Journal of Physical Chemistry A;2017-12-05
3. Metallization of carbon fiber reinforced polymers: Chemical kinetics, adhesion, and properties;Surface and Coatings Technology;2016-12
4. Chemistry and processing of resists for nanolithography;Nanolithography;2014
5. Lithographic Resists;Encyclopedia of Polymer Science and Technology;2012-11-16
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