Fundamental investigation on interaction between hexafluoroisopropylalcohol-containing styrene and photochemical acid generator for rationale design of photoresist system-Reference-Cited by-同舟云学术

Fundamental investigation on interaction between hexafluoroisopropylalcohol-containing styrene and photochemical acid generator for rationale design of photoresist system

Published:2018-12-04 Issue:4 Volume:57 Page:531-538
ISSN:0887-624X
Container-title:Journal of Polymer Science Part A: Polymer Chemistry
language:en
Short-container-title:J. Polym. Sci. Part A: Polym. Chem.

Author:

Doi Takashi¹,Shimokawa Tsutomu¹,Sudo Atsushi²,Endo Takeshi³^ORCID

Affiliation:

1. Research and Development Department; JSR Corporation; Higashi-Shinbashi 1-9-2, Minato-ku, Tokyo 105-8640 Japan

2. Department of Applied Chemistry, Faculty of Science and Engineering; Kindai University; Kowakae 3-4-1, Higashi Osaka, Osaka 577-8502 Japan

3. Molecular Engineering Institute; Kindai University; Kayanomori 11-6, Iizuka, Fukuoka 820-8555 Japan

Publisher

Wiley

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/pola.29291/fullpdf

Reference21 articles.

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4. H. Miyata WO Patent 2017057203 2017

5. T. Sasaki O. Yokokoji WO Patent 2008044741 2008

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