Dynamics of Radical Ions of Hydroxyhexafluoroisopropyl-Substituted Benzenes
Author:
Affiliation:
1. Division of Quantum Science and Engineering, Faculty/Graduate School of Engineering, Hokkaido University, Sapporo 060-8628, Japan
2. The Institute of Scientific and Industrial Research, Osaka University, Ibaraki, Osaka 567-0047, Japan
Funder
Ministry of Education, Culture, Sports, Science and Technology
Publisher
American Chemical Society (ACS)
Subject
Physical and Theoretical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.jpca.7b09842
Reference47 articles.
1. Chemical Amplification Resists for Microlithography
2. Advances in Patterning Materials for 193 nm Immersion Lithography
3. Fluoropolymer-based resists for a single-resist process of 157 nm lithography
4. F2 Laser Resist with Fluorinated Polymers.
5. Fluoropolymer Resists: Progress and Properties
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