Wafer-Scale Synthesis of Reliable High-Mobility Molybdenum Disulfide Thin Films via Inhibitor-Utilizing Atomic Layer Deposition-Reference-Cited by-同舟云学术

Wafer-Scale Synthesis of Reliable High-Mobility Molybdenum Disulfide Thin Films via Inhibitor-Utilizing Atomic Layer Deposition

Author:

Jeon Woojin¹^ORCID,Cho Yeonchoo²,Jo Sanghyun²,Ahn Ji-Hoon³,Jeong Seong-Jun²

Affiliation:

1. Microelectronics Technology Laboratory (LTM); National Center for Scientific Research (CNRS) and CEA-LETI; Minatec campus; 38054 Grenoble France

2. Device Laboratory; Device and System Research Center; Samsung Advanced Institute of Technology; Suwon 16678 Republic of Korea

3. Department of Electronic Material Engineering; Korea Maritime and Ocean University; 727 Taejong-ro Yeongdo-gu Busan 49112 Republic of Korea

Funder

National Research Foundation of Korea

Ministry of Science, ICT and Future Planning

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials,General Materials Science

Reference40 articles.

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