Organosulfide Inhibitor Instigated Passivation of Multiple Substrates for Area-Selective Atomic Layer Deposition of HfO2
Author:
Affiliation:
1. Department of Materials Science and Engineering, Incheon National University, Incheon 22012, South Korea
2. Wilhelm Ostwald Institute for Physical and Theoretical Chemistry, Leipzig University, 04103 Leipzig, Germany
Funder
Merck KGaA
Publisher
American Chemical Society (ACS)
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.chemmater.3c02525
Reference46 articles.
1. Chemical routes to top-down nanofabrication
2. Self-aligned blocking integration demonstration for critical sub-30-nm pitch Mx level patterning with EUV self-aligned double patterning
3. Perspective: New process technologies required for future devices and scaling
4. From the Bottom-Up: Toward Area-Selective Atomic Layer Deposition with High Selectivity
5. Self-assembly of hexadecanethiol molecules on gold from the vapour phase as directed by a two-dimensional array of silica beads
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