Author:
Vollenbroek F. A.,Spiertz E. J.,Kroon H. J. J.
Subject
Materials Chemistry,Polymers and Plastics,General Chemistry,Materials Chemistry,Polymers and Plastics,General Chemistry
Reference5 articles.
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2. “Photoresist Materials and Processes,” McGraw-Hill Book Co., Inc., New York (1975).
3. Deep UV 1:1 projection lithography utilizing negative resist MRS
4. UV hardening of photo‐ and electron beam resist patterns
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