Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials
Cited by
14 articles.
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1. Forefront of Photolithographic Materials;Microelectronic Materials and Processes;1989
2. Photosensitive UV resist of poly(methyl methacrylate) containing a bisazide compound;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1988-05
3. Azide–poly(methylmethacrylate) photoresist for ultraviolet lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1988-01
4. Negative Photoresists;Semiconductor Lithography;1988
5. Additive Processes;Semiconductor Lithography;1988