Synthesis and characterization of novel copolymers with the trimethylsilyl group for deep-UV photoresists
Author:
Publisher
Wiley
Subject
Materials Chemistry,Polymers and Plastics,Surfaces, Coatings and Films,General Chemistry
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3. Studies of Novel Copolymers for Deep-UV Photoresists. I. Synthesis and Properties of Poly(Styrene-co-Silicon-containing maleimide);Polymer Journal;2006-07-28
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