Resists for microlithography: Present status and recent research trends-Reference-Cited by-同舟云学术

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Resists for microlithography: Present status and recent research trends

Published:1992-01 Issue:3 Volume:17 Page:319-360
ISSN:0079-6700
Container-title:Progress in Polymer Science
language:en
Short-container-title:Progress in Polymer Science

Author:

Sugita Kazuyuki,Ueno Nobuo

Publisher

Elsevier BV

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics,Surfaces and Interfaces,Ceramics and Composites

Reference257 articles.

1. Introduction to Microlithography;Thompson,1983

2. Introduction to Microlithography;Willson,1983

3. Introduction to Microlithography;Thompson,1983

4. Materials for Microlithography;Broers,1984

5. Handoutai (Semiconductor) Lithography Gijutsu (Technology);Hou,1984

Cited by 15 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Effect of molecular weight distribution on e-beam exposure properties of polystyrene;Nanotechnology;2013-05-20

2. Near-field optical photolithography for high-aspect-ratio patterning using bilayer resist;Applied Physics Letters;2005-05-16

3. Synthesis and characterization of novel copolymers of carboxyphenylmaleimide and methacrylates with trimethylsiloxy groups for deep-UV photoresists;Journal of Applied Polymer Science;2003-08-27

4. Synthesis and characterization of novel copolymers with the trimethylsilyl group for deep-UV photoresists;Journal of Applied Polymer Science;2002-01-15

5. Complex-radical alternating copolymerization;Progress in Polymer Science;2000-03

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