Synthesis and characterization of novel copolymers of carboxyphenylmaleimide and methacrylates with trimethylsiloxy groups for deep-UV photoresists
Author:
Publisher
Wiley
Subject
Materials Chemistry,Polymers and Plastics,Surfaces, Coatings and Films,General Chemistry
Reference21 articles.
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4. Studies of Novel Copolymers for Deep-UV Photoresists. I. Synthesis and Properties of Poly(Styrene-co-Silicon-containing maleimide);Polymer Journal;2006-07-28
5. Studies of novel copolymers for deep-UV photoresists. I. Synthesis and properties of poly(styrene-co-silicon-containing maleimide);Journal of Applied Polymer Science;2006
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