Studies of novel copolymers for deep-UV photoresists. I. Synthesis and properties of poly(styrene-co-silicon-containing maleimide)
Author:
Publisher
Wiley
Subject
Materials Chemistry,Polymers and Plastics,Surfaces, Coatings and Films,General Chemistry
Reference36 articles.
1. Photoacid generating polymers based on sulfonyloxymaleimides and application as single-component resists
2. Poly(N-phenolicmaleimide) for high-temperature stable near-UV resist
3. Toughening of epoxy resins by N-phenylmaleimide-styrene copolymers
4. Effect of cross-link density on modification of epoxy resins by N-phenylmaleimide-styrene copolymers
5. Modification of bismaleimide resin by N-phenylmaleimide-styrene copolymers
Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Maleimides – a versatile platform for polymeric materials designed/tailored for high performance applications;Polymer-Plastics Technology and Materials;2020-08-28
2. Morphologies and thermal properties of flame-retardant polystyrene/α-zirconium phosphate nanocomposites;Reactive and Functional Polymers;2010-06
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