Thin Film Applications in Advanced Electron Devices-Reference-Cited by-同舟云学术

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Thin Film Applications in Advanced Electron Devices

Published:2014 Issue: Volume:2014 Page:1-2
ISSN:1687-8434
Container-title:Advances in Materials Science and Engineering
language:en
Short-container-title:Advances in Materials Science and Engineering

Author:

Chiu Fu-Chien¹^ORCID,Pan Tung-Ming²^ORCID,Kundu Tapas Kumar³,Shih Chun-Hsing⁴^ORCID

Affiliation:

1. Department of Electronic Engineering, Ming Chuan University, Taoyuan 333, Taiwan

2. Department of Electronic Engineering, Chang Gung University, Taoyuan 333, Taiwan

3. Department of Physics, Visva-Bharati University, West Bengal, Santiniketan 731235, India

4. Department of Electrical Engineering, National Chi Nan University, Nantou 545, Taiwan

Publisher

Hindawi Limited

Subject

General Engineering,General Materials Science

Link

http://downloads.hindawi.com/journals/amse/2014/927358.pdf

Reference8 articles.

1. Structural and Electrical Characteristics of Alternative High-k Dielectrics for CMOS Applications

2. Interfacial and Electrical Characterization in Metal–Oxide–Semiconductor Field-Effect Transistors with CeO2Gate Dielectric

3. An investigation of surface state capture cross-sections for metal–oxide–semiconductor field-effect transistors using HfO2 gate dielectrics

4. Conduction mechanism of resistive switching films in MgO memory devices

5. Physics and Applications of Bismuth Ferrite

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2. Preparation and performance optimization of HfAlO hybrid gate dielectric thin films driven by solution;Journal of Sol-Gel Science and Technology;2024-07-07

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4. Breakdown strength improvement of polypropylene by introducing long-chain branched structures for film capacitors;Journal of Physics D: Applied Physics;2022-03-24

5. Interface Chemistry Evolution and Leakage Current Conduction Mechanism Determination in Rare-Earth-Doped Hf-Based Gate Dielectrics;IEEE Transactions on Electron Devices;2022-01

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