Taylor Expansion of Surface Potential in MOSFET: Application to Pao-Sah Integral
Author:
Affiliation:
1. LaMIPS, Laboratoire commun NXP-CRISMAT, UMR 6508 CNRS ENSICAEN, UCBN, 2, rue de la Girafe BP 5120, F-14079 Caen Cedex 5, France
2. NXP Semiconductors 2, Esplanade Anton Philips Campus Effiscience, Colombelles, BP 20 000 14906 Caen Cedex 9, France
Abstract
Publisher
Hindawi Limited
Subject
Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials
Link
http://downloads.hindawi.com/journals/apec/2010/268431.pdf
Reference20 articles.
1. Characteristics of the metal-Oxide-semiconductor transistors
2. Effects of diffusion current on characteristics of metal-oxide (insulator)-semiconductor transistors
3. Simplified long-channel MOSFET theory
4. Computationally efficient version of the Pao-Sah model with variable mobility
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