Effect of deposition parameters on TiAlN coating using pulsed DC CFUBMS
Author:
Publisher
Informa UK Limited
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://www.tandfonline.com/doi/pdf/10.1179/1743294412Y.0000000091
Reference27 articles.
1. Partial pressure of TiCl4 in CVD of TiN
2. Titanium aluminum nitride films: A new alternative to TiN coatings
3. Magnetron sputtering: a review of recent developments and applications
4. Properties of TiAlN coatings synthesized by closed-field unbalanced magnetron sputtering
5. Mechanical and tribological properties of titanium–aluminium–nitride films deposited by reactive close-field unbalanced magnetron sputtering
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2. Microstructural behavior of the Ti–Al–Mo–N system controlled by Mo content: impact on the performance as hard coatings;Journal of Materials Science;2023-07
3. Structure and fracture toughness of TiAlN thin films deposited by deep oscillation magnetron sputtering;Thin Solid Films;2022-07
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