Properties of TiAlN coatings synthesized by closed-field unbalanced magnetron sputtering
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference18 articles.
1. Titanium aluminum nitride films: A new alternative to TiN coatings
2. Industrial deposition of binary, ternary, and quaternary nitrides of titanium, zirconium, and aluminum
3. On structure and properties of sputtered Ti and Al based hard compound films
4. Titanium aluminum nitride films: A new alternative to TiN coatings
5. Deposition of (Ti,Al)N thin films by organometallic chemical vapor deposition: thermodynarnic predictions and experimental results
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1. Energy Flux at the Substrate During Dual Magnetron Sputtering of TiAlN Coating;Russian Physics Journal;2023-03-15
2. Поток энергии на подложку в процессе дуального магнетронного осаждения покрытий TiAlN;8th International Congress on Energy Fluxes and Radiation Effects;2022-11-14
3. Microstructure and mechanical properties of nano-multilayer structured (AlCrMoTaTi)Nx coatings deposited by closed field unbalanced magnetron sputtering;Journal of Alloys and Compounds;2022-11
4. Industrial Arc Ion Plating and Unbalanced Magnetron Sputtering Coating Deposition: Static and Fatigue Performances of TiAlN-Coated SKH51 Tool Steel;Journal of Materials Engineering and Performance;2022-04-28
5. A comprehensive review of vapour deposited coatings for cutting tools: properties and recent advances;Transactions of the IMF;2022-03-21
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