Structural properties and electrical resistivity of TiNxand Ti1−xAlxN films prepared by reactive dc magnetron sputtering: effect of nitrogen flowrate
Author:
Publisher
Informa UK Limited
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://www.tandfonline.com/doi/pdf/10.1179/174329408X271552
Reference35 articles.
1. Structure and properties of TiN coatings
2. Microstructure and electrical resistivity of TiN films deposited on heated and negatively biased silicon substrates
3. Effect of N2 partial pressure on the microstructure and mechanical properties of reactively sputtered (Ti,Al)N coatings
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