Structural properties of TiN thin films prepared by RF reactive magnetron sputtering
Author:
Funder
UGC-DAE Consortium for Scientific Research, University Grants Commission
Publisher
Elsevier BV
Subject
General Medicine
Reference20 articles.
1. Industrial deposition of binary, ternary, and quaternary nitrides of titanium, zirconium, and aluminum;Knotek;J. Vac. Sci. Technol. A: Vacuum Surfaces Films,1987
2. Corrosion and electrical properties of CrN- and TiN-coated 316L stainless steel used as bipolar plates for polymer electrolyte membrane fuel cells;Lee;Thin Solid Films,2013
3. Schottky barrier contacts of titanium nitride on n-type silicon;Dimitriadis;Appl. Phys. Lett.,1995
4. On the thermal stability of atomic layer deposited TiN as gate electrode in MOS devices;Westlinder;IEEE Electron Device Lett.,2003
5. Titanium nitride as electrode for MOS technology and Schottky diode: alternative extraction method of titanium nitride work function;Lima;Microelectron. Eng.,2012
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