Litho-NeuralODE-Reference-Cited by-同舟云学术

Litho-NeuralODE

Published:2020-09-07 Issue: Volume: Page:
ISSN:
Container-title:Proceedings of the 2020 on Great Lakes Symposium on VLSI
language:
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Author:

Lu Wei¹,Zhang Yuhang¹,Zhang Qing¹,Zhang Xinjie¹,Li Yongfu¹

Affiliation:

1. Shanghai Jiao Tong University, Shang Hai, China

Funder

National Key Research and Development Program of China

Science, Technology and Innovation Action Plan of Shanghai Municipality, China

National Science Foundation of China

Publisher

ACM

Link

https://dl.acm.org/doi/pdf/10.1145/3386263.3406937

Reference30 articles.

1. Design for Manufacturing With Emerging Nanolithography

2. Lithography simulation-based full-chip design analyses;Gupta P.;Proceedings of Design and Process Integration for Microelectronic Manufacturing,2006

3. From Optical Proximity Correction to Lithography-Driven Physical Design (1996--2006): 10 years of Resolution Enhancement Technology and the roadmap enablers for the next decade;Capodieci L.;Optical Microlithography XIX,2006

4. Fast dual graph-based hotspot detection;Kahng A. B.;Photomask Technology,2006

5. Efficient range pattern matching algorithm for process-hotspot detection

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. WDP-BNN: Efficient wafer defect pattern classification via binarized neural network;Integration;2022-07

2. Litho-NeuralODE 2.0: Improving hotspot detection accuracy with advanced data augmentation, DCT-based features, and neural ordinary differential equations;Integration;2022-07

3. Enhancements of Model and Method in Lithography Hotspot Identification;2021 Design, Automation & Test in Europe Conference & Exhibition (DATE);2021-02-01

4. Predictable Coupling Effect Model for Global Placement Using Generative Adversarial Networks with an Ordinary Differential Equation Solver;IEEE Transactions on Circuits and Systems II: Express Briefs;2021