Layout pattern generation and legalization with generative learning models
Author:
Affiliation:
1. The Chinese University of Hong Kong NT, Hong Kong SAR
2. Synopsys Inc.
Funder
Research Grants Council of the Hong Kong Special Administrative Region
Publisher
ACM
Link
https://dl.acm.org/doi/pdf/10.1145/3400302.3415607
Reference34 articles.
1. CVAE-GAN: Fine-Grained Image Generation through Asymmetric Training
2. Anomaly detection
3. Fast detection of largest repeating layout pattern
4. Faster Region-based Hotspot Detection
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