Layout pattern generation and legalization with generative learning models
Author:
Affiliation:
1. The Chinese University of Hong Kong NT, Hong Kong SAR
2. Synopsys Inc.
Funder
Research Grants Council of the Hong Kong Special Administrative Region
Publisher
ACM
Link
https://dl.acm.org/doi/pdf/10.1145/3400302.3415607
Reference34 articles.
1. CVAE-GAN: Fine-Grained Image Generation through Asymmetric Training
2. Anomaly detection
3. Fast detection of largest repeating layout pattern
4. Faster Region-based Hotspot Detection
Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. AI/ML algorithms and applications in VLSI design and technology;Integration;2023-11
2. Machine Learning in EDA: When and How;2023 ACM/IEEE 5th Workshop on Machine Learning for CAD (MLCAD);2023-09-10
3. DiffPattern: Layout Pattern Generation via Discrete Diffusion;2023 60th ACM/IEEE Design Automation Conference (DAC);2023-07-09
4. RCANet: Root Cause Analysis via Latent Variable Interaction Modeling for Yield Improvement;2022 IEEE International Test Conference (ITC);2022-09
5. Machine Learning for Mask Synthesis and Verification;Machine Learning Applications in Electronic Design Automation;2022
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3