Water-Adsorbed Ultrathin GeO<sub>2</sub>/Ge and SiO<sub>2</sub>/Si Structure Studied In Situ by Near-Ambient-Pressure X-ray Photoelectron Spectroscopy-Reference-Cited by-同舟云学术

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Water-Adsorbed Ultrathin GeO₂/Ge and SiO₂/Si Structure Studied In Situ by Near-Ambient-Pressure X-ray Photoelectron Spectroscopy

Published:2017 Issue:7 Volume:38 Page:330-335
ISSN:0388-5321
Container-title:Hyomen Kagaku
language:en
Short-container-title:Journal of The Surface Science Society of Japan

Author:

ARIMA Kenta¹

Affiliation:

1. Osaka University

Publisher

Surface Science Society Japan

Subject

General Earth and Planetary Sciences,General Engineering,General Environmental Science

Link

https://www.jstage.jst.go.jp/article/jsssj/38/7/38_330/_pdf

Reference30 articles.

1. 1) H. Matsubara, T. Sasada, M. Takenaka and S. Takagi: Appl. Phys. Lett. 93, 032104 (2008).

2. 2) T. Hosoi, K. Kutsuki, G. Okamoto, M. Saito, T. Shimura and H. Watanabe: Appl. Phys. Lett. 94, 202112 (2009).

3. 3) Y. Oniki and T. Ueno: Appl. Phys. Express 4, 081101 (2011).

4. 4) Y. Oniki and T. Ueno: Jpn. J. Appl. Phys. 51, 04DA01 (2012).

5. 5) S. Ogawa, T. Suda, T. Yamamoto, K. Kutsuki, I. Hideshima, T. Hosoi, T. Shimura and H. Watanabe: Appl. Phys. Lett. 99, 142101 (2011).

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