Multiple parametric nanoscale measurements with high sensitivity based on through‐focus scanning optical microscopy
Author:
Affiliation:
1. School of Instrumentation and Optoelectronic Engineering Beihang University Beijing China
2. Chinese Academy of Sciences Institute of Microelectronics of CAS Beijing China
Funder
National Natural Science Foundation of China
Publisher
Wiley
Subject
Histology,Pathology and Forensic Medicine
Link
https://onlinelibrary.wiley.com/doi/pdf/10.1111/jmi.12792
Reference35 articles.
1. Patterned defect and CD metrology by TSOM beyond the 22-nm node
2. Through-focus scanning-optical-microscope imaging method for nanoscale dimensional analysis
3. Linewidth measurement technique using through-focus optical images
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