Author:
Arceo Abraham,Bunday Benjamin,Vartanian Victor,Attota Ravikiran
Cited by
20 articles.
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1. Enhancing 6 nm CD Patterned Defect Classification with TSOM and CNNs;2023 34th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC);2023-05-01
2. 先进节点图案化晶圆缺陷检测技术;Laser & Optoelectronics Progress;2023
3. Optical wafer defect inspection at the 10 nm technology node and beyond;International Journal of Extreme Manufacturing;2022-04-21
4. Metrology;2021 IEEE International Roadmap for Devices and Systems Outbriefs;2021-11
5. Imaging error compensation method for through‐focus scanning optical microscopy images based on deep learning;Journal of Microscopy;2021-04-14