Surface Potential and Topography Measurements of Gallium Nitride on Sapphire by Scanning Probe Microscopy
Author:
Affiliation:
1. Chiba Institute of Technology, Graduate School of Engineering
2. Shibaura Institute of Technology
Publisher
Institute of Electrical Engineers of Japan (IEE Japan)
Subject
Electrical and Electronic Engineering,Mechanical Engineering
Link
https://www.jstage.jst.go.jp/article/ieejsmas/136/4/136_96/_pdf
Reference15 articles.
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2. (7) J. Elisner, R. Jones, M. I. Heggie, P. K. Sitch, M. Haugk, Th. Frauenheim, S. Öberg, and P. R. Briddon: “Deep acceptors trapped at threading-edge dislocations in GaN”, Phys. Rev. B., Vol. 58, p. 12571 (1998)
3. (9) G. Binning, C. F. Quate, and Ch. Gerber: “Atomic Force Microscope”, Phys. Rev. Lett., Vol. 56, p. 930 (1986)
4. (11) M. Nonnenmacher, M. P. O'Boyle, and H. K. Wickramasinghe: “Kelvin probe force microscopy”, Appl. Phys. Lett., Vol. 58, p. 2921 (1991)
5. (13) N. Nakada, M. Mori, H. Ishikawa, T. Egawa, and T. Jinbo: “Correlation between Electrical and Surface Properties of n-GaN on Sapphire Grown by Metal-Organic Chemical Vapor Deposition”, Jpn. J. Appl. Phys., Vol. 42, p. 2573 (2003)
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