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Three-dimensional holographic lithography by an iterative algorithm

Published:2011-06-23 Issue:13 Volume:36 Page:2495
ISSN:0146-9592
Container-title:Optics Letters
language:en
Short-container-title:Opt. Lett.

Author:

Cowling Joshua J.,Williams Gavin L.,Purvis Alan,McWilliam Richard,Toriz-Garcia Jose J.,Seed Nicholas L.,Soulard Florian B.,Ivey Peter A.

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics

Reference9 articles.

1. Controlled-width track in through silicon via using 3D holographic photolithography with modified electrodepositable photoresist

2. Nonplanar photolithography with computer-generated holograms

3. Maskless photolithography via holographic optical projection

4. Resolution enhanced proximity printing by phase and amplitude modulating masks

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1. Fabrication of graphene field effect transistors on complex non-planar surfaces;Applied Physics Letters;2024-09-09

2. Holographic Lithography Techniques (Invited);CHIN J LASERS;2024

3. Spatial Light Modulator-Based Maskless Holographic Lithography on Nonplanar Surfaces;Imaging and Applied Optics Congress;2020

4. High-contrast pattern reconstructions using a phase-seeded point CGH method;Applied Optics;2016-02-26

5. High-contrast pattern reconstructions using a phase-seeded point CGH method;Applied Optics;2016-02-26

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