Amorphous silicon and amorphous silicon nitride films prepared by a plasma-enhanced chemical vapor deposition process as optical coating materials
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Publisher
The Optical Society
Reference10 articles.
1. Simulation of the gas‐phase processes in remote‐plasma‐activated chemical‐vapor deposition of silicon dielectrics using rare gas–silane‐ammonia mixtures
2. Mechanism of SiN x H y Deposition from NH 3 ‐ SiH4 Plasma
3. Atomic microstructure and electronic properties ofa‐SiNx:H deposited by radio frequency glow discharge
4. Silicon/silicon oxide and silicon/silicon nitride multilayers for extreme ultraviolet
5. Optical properties of amorphous multilayers a-Si:H/a-Si3N4:H with random well or barrier layer
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