Simulation of the gas‐phase processes in remote‐plasma‐activated chemical‐vapor deposition of silicon dielectrics using rare gas–silane‐ammonia mixtures-Reference-Cited by-同舟云学术

Simulation of the gas‐phase processes in remote‐plasma‐activated chemical‐vapor deposition of silicon dielectrics using rare gas–silane‐ammonia mixtures

Published:1992-05 Issue:9 Volume:71 Page:4173-4189
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Kushner Mark J.

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.350821

Reference58 articles.

1. Plasma polymerization and deposition of amorphous hydrogenated silicon from rf and dc silane plasmas

2. Microstructure of plasma‐deposited a‐Si : H films

3. Ion energy distributions in radio‐frequency discharges

4. Computer simulation of materials processing plasma discharges

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