In situ aberration measurement technique based on principal component analysis of aerial image
Author:
Publisher
The Optical Society
Subject
Atomic and Molecular Physics, and Optics
Reference17 articles.
1. Aberration averaging using point spread function for scanning projection systems
2. Impact of wavefront errors on low k1 processes at extremely high NA
3. Optical lithography into the millennium: sensitivity to aberrations, vibration, and polarization
4. Application of the aberration ring test (ARTEMIS) to determine lens quality and predict its lithographic performance
5. Measurement technique for in situ characterizing aberrations of projection optics in lithographic tools
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1. An Optimization Method To Improve Accuracy of the Wavefront Aberration Measurement Technique Based on Principal Component Analysis of Aerial Images;2023 International Workshop on Advanced Patterning Solutions (IWAPS);2023-10-26
2. 基于空间像主成分分析的光刻投影物镜波像差检测技术;Acta Optica Sinica;2023
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