Accurate characterization of nanoimprinted resist patterns using Mueller matrix ellipsometry-Reference-Cited by-同舟云学术

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Accurate characterization of nanoimprinted resist patterns using Mueller matrix ellipsometry

Published:2014-06-12 Issue:12 Volume:22 Page:15165
ISSN:1094-4087
Container-title:Optics Express
language:en
Short-container-title:Opt. Express

Author:

Chen Xiuguo,Liu Shiyuan,Zhang Chuanwei,Jiang Hao,Ma Zhichao,Sun Tangyou,Xu Zhimou

Funder

National Natural Science Foundation of China (NSFC)

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics

Reference27 articles.

1. Imprint Lithography with 25-Nanometer Resolution

2. Sub-10 nm imprint lithography and applications

3. Nanoimprint pattern transfer quality from specular x-ray reflectivity

4. Real-Time Shape Evolution of Nanoimprinted Polymer Structures during Thermal Annealing

5. Measurement of residual thickness using scatterometry

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