Beam drift and partial probe coherence effects in EUV reflective-mode coherent diffractive imaging
Author:
Publisher
The Optical Society
Subject
Atomic and Molecular Physics, and Optics
Reference34 articles.
1. Readiness of EUV Lithography for Insertion into Manufacturing: The IMEC EUV Program
2. A novel method for utilizing AIMS to evaluate mask repair and quantify over-repair or under-repair condition
3. Commissioning an EUV mask microscope for lithography generations reaching 8 nm
4. Wavelength-specific reflections: A decade of extreme ultraviolet actinic mask inspection research
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