Attenuated phase-shifting masks of chromium aluminum oxide
Author:
Publisher
The Optical Society
Reference8 articles.
1. Improving resolution in photolithography with a phase-shifting mask
2. Thin film materials for the preparation of attenuating phase shift masks
3. Required optical characteristics of materials for phase-shifting masks
4. Optical property simulation of single-layer halftone phaseshifting masks for DUV microlithography
5. Monolayer Halftone Phase-Shifting Mask for KrF Excimer Laser Lithography
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1. Stochastic Patterning Simulation Using Attenuated Phase-Shift Mask for Extreme Ultraviolet Lithography;Applied Physics Express;2013-09-01
2. Very Thin Extreme Ultraviolet Mask Absorber Material for Extremely Fine Pitch Patterning;Applied Physics Express;2013-07-01
3. Atomic and electronic structures of amorphous Al2O3;Chemical Physics Letters;2004-06
4. Resonant Photoemission Spectroscopy and Theoretical Calculation of the Valence Band Structure in Chromium Aluminum Oxynitride;Japanese Journal of Applied Physics;2003-12-10
5. Photoblanks for advanced lithography based on Corning high-purity fused silica (HPFS);SPIE Proceedings;2003-06-25
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