Author:
Lee Jae Uk,Hong Seongchul,Ahn Jinho
Subject
General Physics and Astronomy,General Engineering
Cited by
10 articles.
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1. Attenuated phase shift masks: a wild card resolution enhancement for extreme ultraviolet lithography?;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-05-11
2. Reduction of PdO/Al2O3 in Liquid Cyclohexane Followed In Situ by ATR-IR, High-Energy XRD, and XAS;The Journal of Physical Chemistry C;2021-07-16
3. Investigation of waveguide modes in EUV mask absorbers;Journal of Micro/Nanopatterning, Materials, and Metrology;2021-05-20
4. Perspectives and tradeoffs of absorber materials for high NA EUV lithography;Journal of Micro/Nanolithography, MEMS, and MOEMS;2020-10-01
5. Attenuated phase shift mask for extreme ultraviolet: can they mitigate three-dimensional mask effects?;Journal of Micro/Nanolithography, MEMS, and MOEMS;2018-08-11