Optical property simulation of single-layer halftone phaseshifting masks for DUV microlithography-Reference-Cited by-同舟云学术

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Optical property simulation of single-layer halftone phaseshifting masks for DUV microlithography

Published:1996-10-01 Issue:10 Volume:11 Page:1450-1455
ISSN:0268-1242
Container-title:Semiconductor Science and Technology
language:
Short-container-title:Semicond. Sci. Technol.

Author:

Jiang Zhong-Tao,Hong Seungbum,Kim Eunah,Bae Byeong-Soo,No Kwangsoo,Hwangbo Chang Kwon,Lim Sung-Chul,Woo Sang-Gyun,Koh Young-Bum

Publisher

IOP Publishing

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference19 articles.

1. New KrF and ArF Excimer Lasers for Advanced Deep Ultraviolet Optical Lithography

2. Improving resolution in photolithography with a phase-shifting mask

3. 0.3-micron Optical Lithography Using A Phase-Shifting Mask

4. The Application of Deep UV Phase Shifted-Single Layer Halftone Reticles to 256 Mbit Dynamic Random Access Memory Cell Patterns

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Optimal phase shift mask and multilayer stack with the evaluation of imaging performance and process latitude in extreme ultraviolet high numerical aperture;Japanese Journal of Applied Physics;2021-04-20

2. A Study of Cr–Al Oxides for Single-Layer Halftone Phase-Shifting Masks for Deep-Ultraviolet Region Photolithography;Japanese Journal of Applied Physics;1998-07-15

3. Attenuated phase-shifting masks of chromium aluminum oxide;Applied Optics;1998-07-01

4. The Application of Silicon Rich Nitride Films for Use as Deep-Ultraviolet Lithography Phase-Shifting Masks;Japanese Journal of Applied Physics;1998-02-15

5. Single-layer halftone phase-shifting masks for DUV microlithography: optical property simulation and chromium compound film preparation;Applied Surface Science;1997-04

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