Single-layer halftone phase-shifting masks for DUV microlithography: optical property simulation and chromium compound film preparation-Reference-Cited by-同舟云学术

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Single-layer halftone phase-shifting masks for DUV microlithography: optical property simulation and chromium compound film preparation

Published:1997-04 Issue: Volume:113-114 Page:680-684
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Jiang Zhong-Tao,Hong Seungbum,Kim Eunah,Bae Byeong-Soo,Lim Sungchul,Woo Sang-Gyun,Koh Young-Bum,No Kwangsoo

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference8 articles.

1. Improving resolution in photolithography with a phase-shifting mask

2. Imaging Characteristics of Multi-Phase-Shifting and Halftone Phase-Shifting Masks

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Stochastic Patterning Simulation Using Attenuated Phase-Shift Mask for Extreme Ultraviolet Lithography;Applied Physics Express;2013-09-01

2. Very Thin Extreme Ultraviolet Mask Absorber Material for Extremely Fine Pitch Patterning;Applied Physics Express;2013-07-01

3. The Application of Silicon Rich Nitride Films for Use as Deep-Ultraviolet Lithography Phase-Shifting Masks;Japanese Journal of Applied Physics;1998-02-15

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