Plasma ion assisted deposition of hafnium dioxide using argon and xenon as process gases
Author:
Publisher
The Optical Society
Subject
Electronic, Optical and Magnetic Materials
Reference31 articles.
1. Synthesis and characterization of HfO2 and ZrO2 thin films deposited by plasma assisted reactive pulsed laser deposition at low temperature
2. Amorphous hafnium oxide thin films for antireflection optical coatings
3. A comparative study of the UV optical and structural properties of SiO2, Al2O3, and HfO2 single layers deposited by reactive evaporation, ion-assisted deposition and plasma ion-assisted deposition
4. Optical properties of a-HfO2 thin films
5. Surface, structural and optical properties of sol-gel derived HfO2 films
Cited by 34 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Two excitation pathways of Pr3+ ion emission in HfO2:Si:Pr films depending on crystalline phase transformations in annealing;Journal of Luminescence;2023-06
2. Plasma-Enhanced Atomic Layer Deposition of HfO2 with Substrate Biasing: Thin Films for High-Reflective Mirrors;ACS Applied Materials & Interfaces;2022-03-21
3. Large area ion beam sputtered dielectric ultrafast mirrors for petawatt laser beamlines;Optics Express;2022-02-09
4. Influence of temperature and plasma parameters on the properties of PEALD HfO2;Optical Materials Express;2021-06-07
5. Plasma-ion-assisted deposition of HfO2 films with low UV absorption;Surface and Coatings Technology;2020-08
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3